What is the Silicon Nitride used for?
Silicon nitride has an inorganic chemical composition with Si3N4. It's an important structural ceramic material. The material can resist both heat and cold shocks. It can be heated up to 1,000 degrees Fahrenheit in air. The excellent properties of silicon-nitride ceramics is why it's often used in the manufacture of mechanical components, such as bearings. A silicon nitride-ceramics heat-receiving layer for engine components that is resistant to high heat and difficult to transmit heat can help improve the quality of diesel engines as well as save fuel.
For what purpose is Silicon Nitride?
Silicon nitride serves as a high quality refractory material. For example, SI3N4 SIC refractory is combined with sic blast furnace shaft parts. This fine-structure ceramic material is known for its uniformity and mechanical strength. It's also called the SI3N4BN-BN series horizontal continuously casting separation ring. The material meets continuous casting technology requirements and has excellent thermal shock resistance.
Materials made of silicon nitride are extremely stable in temperature, resistant to oxidation, and have high dimensions. Covalent compounds with high bond strength can create an oxide protective shield in the atmosphere. Silicon nitride also exhibits good chemical stability. It doesn't oxidize, so it can not be infiltrated/corroded or infiltrated with many molten alloys or metals like lead, aluminum, silver or brass. But, it can be corroded or contaminated by molten substances such as magnesium and nickel-chromium alloy.
These ceramic materials from silicon nitride are suitable for use in high temperature engineering components, advanced and complex refractory materials, chemical industry corrosion-resistant, sealing and cutting components as well.
The strong bonds that silicon nitride makes with aluminum dioxide, silicon carbide or thorium oxide can make it a good bonding material.
You can use silicon nitride in solar cells. When the silicon nutride film has been coated with the PECVD procedure, it can serve as an antireflection film that reduces incident light. However, during the process of deposition of silicon nitride, the hydrogen atoms produced by the reaction enter both the silicon nanorode and the silicon wafer. These acted as passivation defect. However, this atomic relationship of silicon silicon nitride with silicon nitride does not necessarily equal 4:3. It is subject to fluctuations due to process conditions. Also, different physical properties of films that correspond to different atomic relationships can have different physical characteristics.
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